Automatic Wafer Cleaning Device After Light Resistance
Touchscreen Control
IoT Integration
Independent Liquid Control
Nozzle Liquid Flow Control
Product Overview
Semiconductor cleaning machine is essential for removing photoresist and ensuring precise cleaning of wafers after grinding. It plays a vital role in semiconductor manufacturing, ensuring that wafers are free of contaminants and prepared for further processing. JYN advanced system is designed to meet the specific needs of the semiconductor industry, offering customized solutions for wafer sizes ranging from 150mm to 300mm.
Application
The semiconductor cleaning machine is used in the following applications:
Wafer cleaning after grinding processes.
Removal of photoresist layers, particularly for wafers used in advanced semiconductor processes of 19nm or higher.
Our wafer cleaning machine can accommodate various wafer sizes, including 150mm, 200mm, and 300mm, with customizable options available to meet specific production needs.
Product Feature
Load Ports:
JYN semiconductor cleaning machine configurable with 2 or 3 load ports for maximum flexibility.
Touchscreen Control:
Our industrial wafer processing control machine with a touch screen operation interface, making it both con
venient and fast to use.
IoT Integration:
Equipped with genuine industrial IoT configuration software, our wafer surface cleaner can seamless control and monitoring.
SECS/GEM Communication Protocol:
Full support for SECS/GEM communication protocol and data transmission, ensuring smooth integration into your fab.
Horizontal Chamber Design:
It eliminates the risk of cross-contamination during the cleaning process.
Wafer Handling Manipulator:
Our microchip cleaning equipment equipped with a two-arm wafer handling manipulator imported from Japan for high efficiency and stability.
Multiple Cleaning Chambers:
Comes with up to 8 cleaning chambers (customizable based on requirements), ensuring scalability for high-volume operations.
Independent Liquid Control:
Each cleaning chamber operates with independent liquid control to prevent cross-contamination.
Nozzle Liquid Flow Control:
Features an accurate nozzle liquid flow control system that ensures precise cleaning.
Check our all efficent and quality semiconductor machine.
Our products are very popular, if you are interested in our products, please contact us as soon as possible. Email: jyn@jyn-online.com
Product Name: Automatic Wafer Cleaning Device After Light Resistance