Automatic Wafer Cleaning Machine After Scrubbing

(1) Application field: removal of photoresistance/wafer cleaning after grinding

(2) Wafer size: 150mm&200mm&300mm (customizable)

(3) Process indicators: wafers with processes above 19nm can be cleaned

(4) Equipment features:

◎ Equipped with 2 or 3 Load ports

◎ Industrial control machine touch screen operation control, convenient and fast

◎ Use genuine industrial iot configuration software for control and monitoring

◎ Support SECS/GEM communication protocol and data transmission

◎ Horizontal chamber, no cross contamination

◎ Equipped with two-arm wafer handling manipulator imported from Japan, efficient and stable

◎ Equipped with up to 8 cleaning chambers (customized)

◎ Cleaning liquid independent control, no cross contamination

◎ Equipped with nozzle liquid flow accurate control system